SÜSS MicroTec Launches Mask Aligner MA200 Gen3

SÜSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, has launched the new Mask Aligner MA200 Gen3. The tool is designed for high volume manufacturing and can be used for exposing wafers with a diameter of up to 200 mm. This latest generation tool is a further development of the very successful MA200 Compact platform, of which the 100th tool was recently delivered to a customer.

The MA200 Gen3 combines the well-established SÜSS MicroTec Mask Aligner technology with several new features, which render it the leading exposure system in the areas of advanced packaging and MEMS. Special application fields are exposure processes with thick photo resists for advanced packaging, wafer level packaging and 3D integration as well as the production of MEMS.

The third tool generation incorporates an improved throughput as well as a better process administration and -definition. The new features lead to an overall improved cost of ownership.

"Our well established Mask Aligner technology is upgraded regularly to meet the latest technological challenges and is constantly developed further to address the future demands of exposure applications.", says Frank P. Averdung, President and CEO of SÜSS MicroTec. "The advantages of the MA200 Gen3 are a high throughput of 140 200 mm wafers per hour coupled with very good process reliability."

Disclaimers of Warranties

1. The website does not warrant the following:

1.1 The services from the website meets your requirement;

1.2 The accuracy, completeness, or timeliness of the service;

1.3 The accuracy, reliability of conclusions drawn from using the service;

1.4 The accuracy, completeness, or timeliness, or security of any information that you download from the website

2. The services provided by the website is intended for your reference only. The website shall be not be responsible for investment decisions, damages, or other losses resulting from use of the website or the information contained therein<

Proprietary Rights

You may not reproduce, modify, create derivative works from, display, perform, publish, distribute, disseminate, broadcast or circulate to any third party, any materials contained on the services without the express prior written consent of the website or its legal owner.